Wafer-scale two-dimensional semiconductors from printed oxide skin of liquid metals

Benjamin J. Carey, Jian Zhen Ou, Rhiannon M. Clark, Kyle J. Berean, Ali Zavabeti, Anthony S. R. Chesman, Salvy P. Russo, Desmond W. M. Lau, Zai-Quan Xu, Qiaoliang Bao, Omid Kavehei, Brant C. Gibson, Michael D. Dickey, Richard B. Kaner, Torben Daeneke, Kourosh Kalantar-Zadeh

A variety of deposition methods for two-dimensional crystals have been demonstrated; however, their wafer-scale deposition remains a challenge. Here we introduce a technique for depositing and patterning of wafer-scale two-dimensional metal chalcogenide compounds by transforming the native interfacial metal oxide layer of low melting point metal precursors (group III and IV) in liquid form. In an oxygen-containing atmosphere, these metals establish an atomically thin oxide layer in a self-limiting reaction. The layer increases the wettability of the liquid metal placed on oxygen-terminated substrates, leaving the thin oxide layer behind. In the case of liquid gallium, the oxide skin attaches exclusively to a substrate and is then sulfurized via a relatively low temperature process. By controlling the surface chemistry of the substrate, we produce large area two-dimensional semiconducting GaS of unit cell thickness (∼1.5 nm). The presented deposition and patterning method offers great commercial potential for wafer-scale processes.